• Consists of a 10 MHz pattern generator to produce the deflection signal data for the patterns to be written by the SEM, e-beam or FIB system.


• Implements intelligent writing schemes and shape primitives to take full benefit of limited deflection chain bandwidths.


• Designs pattern data.


• Produces respective deflection signals for beam steering of charged particle beams.


• Upgrades Scanning Electron Microscope, FIB or dual beam tool systems to perform advanced nanolithography on semiconductor or other materials.


• Comes with user-friendly and application-based ECP design and control software.

For more information, please view the XENOS XeDraw2 Writer Product Sheet (276 KB .pdf file)